Glove box integrated magnetron sputtering coating machine

　　 SMS-400 Glove Box High Vacuum Multi-Target Magnetron Sputtering Coating Machine

　　 Vacuum Chamber: Adopts a vertical square structure. The front door is a horizontally sliding type, located inside the glove box. The front door facilitates the loading and unloading of targets and samples in a protective environment. The rear door facilitates cleaning and maintenance of the vacuum chamber (the rear door has a locking device to keep the chamber sealed and isolated from the atmosphere under inflation conditions). The entire machine is located under the glove box, saving floor space;

　　 Vacuum System: Domestic molecular pump as the main pumping pump, the ultimate vacuum is as high as 2.0✕10 ^-5 Pa, optional imported magnetic levitation molecular pump or cryopump as the main pumping pump, the ultimate vacuum is as high as 3.0✕10 ^-6 Pa;

　　 Vacuum Pumping Speed: Atmosphere～5✕10-4Pa≤30min (in glove box environment);

　　 Substrate Table: Maximum 120mm substrate/15～25mm ITO/FTO glass 25 pieces, substrate table rotation, speed 0～20r/min adjustable, substrate can choose heating (room temperature～300℃ adjustable and controllable) or water cooling, substrate table optional lifting, source-substrate distance maximum 350mm;

　　 Sputtering Power Supply and Target: 3~4 sets of RF/DC power supplies, permanent magnet/strong magnet targets optional, multi-element co-deposition to obtain composite films/separate deposition to obtain multi-layer films, powerful functions, stable performance; vacuum professional sputtering power supply, constant current/constant power control, current and power can be preset, automatic control function of one-button start and stop can be realized;

　　 Control Method: PLC+touch screen control system, with leakage self-check and prompt, communication failure, realizing one-button vacuum stop.